Design Engineer (H/F)

About Plessey We’re building the hardware foundation for next-era computing. Plessey is a world-leading technology company driving the next generation of photonic devices and systems. With over 70 years of innovation, we combine research, materials science, process engineering, and manufacturing under one roof. Join us to work on breakthrough technologies shaping the future of light-based technology and computing Curiosity fuels us: we question assumptions, explore new ideas, and innovate with light-based technologies. By investing in and empowering our people, we strengthen Plessey’s impact and help shape the future of optical technology. We have each other’s backs, own our actions, and uphold the highest standards of integrity and safety. Join our team as a Mask Design Engineer and play a key role in developing next-generation semiconductor technologies. Own the end-to-end mask and reticle procurement process, including placing orders, managing workflows, and ensuring accurate and complete data submission to mask vendors. Drive fast, right-first-time ordering by translating design outputs into mask orders efficiently while maintaining a strong focus on accuracy and quality. Validate vendor outputs by reviewing digitised and fractured mask data to ensure design intent is fully preserved through the mask manufacturing process. Act as the technical interface between design teams, fabrication sites, and mask suppliers, proactively resolving issues and ensuring clear communication across all parties. Foster strong cross-functional collaboration across design, process, and manufacturing teams to ensure timely, aligned, and reliable mask delivery schedules. Degree in Electrical Engineering, Physics, Materials Science, or related field. At least 2 + years industry experience in semiconductor or photonics environments, ideally within lithography, mask house, process integration or device engineering teams. Hands-on experience with mask data flow / tape-out processes (e.g. GDSII, OASIS, data verification, fracturing concepts) Familiarity with EDA tools and design environments (e.g. layout viewers, mask data preparation tools, or verification tools). Understanding of design rules, lithography constraints, and manufacturability requirements. Strong attention to detail and commitment to high-quality output. Eagerness to learn and develop technical expertise in mask design.